Defect control methods for SIMOX SOI wafer manufacture and processing

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2000, Pages 323-327

  Alles, Mike ^a   Dunne, John ^a   MacNish, Shawn ^a   Burns, Mark ^a   Cheung, Lisa ^a  

^a Ibis Technology Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; FILM PREPARATION; INCLUSIONS; LIGHT SCATTERING; OXIDES; SILICON ON INSULATOR TECHNOLOGY; SURFACE ROUGHNESS; THIN FILMS;

BURIED OXIDES; MULTI-LAYER INTERFERENCES;

SILICON WAFERS;

EID: 0034479042     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)