Comparative study of two KLA-Tencor advanced patterned wafer inspection systems

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2000, Pages 141-

  Rowley, Steven ^a   Thorne, Sean ^a   Bousetta, Ali ^b   Perry, Cathy ^b   Dutton, Cathy ^b  

^a TEXAS INSTRUMENTS   (United States)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

Defect control; Defect Inspection; In line inspection; Laser inspection; Optical inspection

Indexed keywords

CRYSTAL DEFECTS; INSPECTION; LASER APPLICATIONS;

DEFECT CONTROL; INLINE PATTERNED WAFER INSPECTION SYSTEMS; OPTICAL INSPECTION;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0034478325     PISSN: 10788743     EISSN: None     Source Type: Journal    
DOI: 10.1109/ASMC.2000.902575     Document Type: Article

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