Medium-dose SIMOX quality improvement for advanced CMOS applications

IEEE International SOI Conference

Volumn , Issue , 2000, Pages 46-47

  Dolan, R ^a   Alles, M ^a   Anc, M ^a   Cordts, B ^a   Dunne, J ^a   Gindlseperger, M ^a   Hornblower, B ^a   Jang, T Y ^a   Powell, M ^a   Blake, J ^a   Nakai, T ^a  

^a Ibis Technology Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEPARATION BY IMPLANTATION OXYGEN (SIMOX);

INERT GASES; ION IMPLANTATION; OXYGEN; SEMICONDUCTING FILMS; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; THIN FILMS;

CMOS INTEGRATED CIRCUITS;

EID: 0034473802     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)