Surface finishing of cleaved SOI films using Epi technologies

IEEE International SOI Conference

Volumn , Issue , 2000, Pages 12-13

  Thilderkvist, AnnaLena ^a   Kang, Sien ^a   Fuerfanger, Martin ^a   Malik, Igor J ^a  

^a Epi Substrates Div   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL FINISHING; SILICON WAFERS; SUBSTRATES; ULTRATHIN FILMS;

SURFACE FINISHING;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0034472766     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)