Linearity and low-noise performance of SOI MOSFETs for RF applications

IEEE International SOI Conference

Volumn , Issue , 2000, Pages 30-31

  Adan, A O ^a   Shitara, S ^a   Tanba, N ^a   Fukumi, M ^a   Yoshimasu, T ^a  

^a SHARP CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSTALK; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC INDUCTORS; GATES (TRANSISTOR); Q FACTOR MEASUREMENT; SILICON ON INSULATOR TECHNOLOGY; SPURIOUS SIGNAL NOISE; SUBSTRATES; WIRELESS TELECOMMUNICATION SYSTEMS;

LOW-NOISE AMPLIFIERS (LNA);

MOSFET DEVICES;

EID: 0034470986     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)