Characteristics of copper diffusion into low dielectric constant plasma polymerized cyclohexane thin films

Japanese journal of applied physics

Volumn 39, Issue 12 B, 2000, Pages

  Shim, Cheonman ^a   Choi, Jayoung ^a   Jung, Donggeun ^a   Lee, Nae Eung ^a   Yang, Cheol Woong ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC POLYMERS; COPPER; CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION IN SOLIDS; PERMITTIVITY; POLYMERIZATION;

PLASMA POLYMERIZED CYCLOHEXANE;

PLASTIC FILMS;

EID: 0034470753     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l1327     Document Type: Article

References (16)