FUV reflectometer for in situ characterization of thin films deposited under UHV

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4139, Issue , 2000, Pages 92-101

  Larruquert, Juan I ^a   Aznarez, Jose A ^a   Mendez, Jose A ^a  

^a CSIC   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AGING OF MATERIALS; DEPOSITION; MULTILAYERS; OPTICAL COATINGS; OPTICAL INSTRUMENTS; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION;

FAR ULTRAVIOLET REFLECTOMETERS; TRANSMITTANCE MEASUREMENTS;

REFLECTOMETERS;

EID: 0034468958     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410512     Document Type: Conference Paper

References (8)