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Volumn , Issue 148, 2000, Pages 775-785

The influence of temperature, fluence, dose rate, and helium production on defect accumulation and swelling in silicon carbide

Author keywords

Dual beam irradiation method; Ion irradiation; Silicon carbide; Swelling

Indexed keywords

AMORPHIZATION; CHEMICAL VAPOR DEPOSITION; HELIUM; ION BOMBARDMENT; IRRADIATION; POLYCRYSTALLINE MATERIALS; SWELLING; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0034462895     PISSN: 03070492     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.