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Volumn , Issue 148, 2000, Pages 775-785
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The influence of temperature, fluence, dose rate, and helium production on defect accumulation and swelling in silicon carbide
a a a a
a
NONE
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Author keywords
Dual beam irradiation method; Ion irradiation; Silicon carbide; Swelling
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Indexed keywords
AMORPHIZATION;
CHEMICAL VAPOR DEPOSITION;
HELIUM;
ION BOMBARDMENT;
IRRADIATION;
POLYCRYSTALLINE MATERIALS;
SWELLING;
TRANSMISSION ELECTRON MICROSCOPY;
ION IRRADIATION;
SILICON CARBIDE;
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EID: 0034462895
PISSN: 03070492
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (4)
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References (10)
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