X-ray stress measurement of silicon single crystal

Materials Science Research International

Volumn 6, Issue 4, 2000, Pages 255-262

  Suzuki, H ^a   Akita, K ^a   Misawa, H ^a  

^a TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

Diffraction profile; Lattice strain; Semiconductor device; Single crystal; X ray stress measurement

Indexed keywords

CRYSTAL LATTICES; ELASTICITY; OSCILLATIONS; SEMICONDUCTOR DEVICES; SINGLE CRYSTALS; STRAIN GAGES; STRESS ANALYSIS; X RAY CRYSTALLOGRAPHY;

X RAY STRESS MEASUREMENT;

SEMICONDUCTING SILICON;

EID: 0034454975     PISSN: 13411683     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)