64Kbit CMVP FeRAM macro with reliable retention/imprint characteristics

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2000, Pages 783-786

  Kobayashi, S ^a   Amanuma, K ^a   Mori, H ^a   Kasai, N ^a   Maejima, Y ^a   Seike, A ^a   Tanabe, N ^a   Tatsumi, T ^a   Yamada, J ^a   Miwa, T ^a   Koike, H ^a   Hada, H ^a   Toyoshima, H ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHIP SCALE PACKAGES; CMOS INTEGRATED CIRCUITS; FERROELECTRIC DEVICES; LOGIC DEVICES; PASSIVATION; PLASMA DEVICES;

HYDROGEN BARRIER EFFECT;

RANDOM ACCESS STORAGE;

EID: 0034454064     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. Capacitor-on-metal-stacked-plug (CMVP) memory cell for 0.25μm CMOS embedded FeRAM
2. A 128-Kb FeRAM macro for contact/contactless smart card microcontroller