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Volumn 4229, Issue , 2000, Pages 70-78
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Yield implications of wafer edge engineering
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Author keywords
Edge integration; Wafer edge engineering
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Indexed keywords
CONTAMINATION;
CRYSTAL DEFECTS;
SEMICONDUCTING FILMS;
SEMICONDUCTOR DEVICE MANUFACTURE;
EDGE INTEGRATION;
WAFER EDGE ENGINEERING;
SILICON WAFERS;
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EID: 0034453417
PISSN: 0277786X
EISSN: None
Source Type: Journal
DOI: 10.1117/12.404862 Document Type: Article |
Times cited : (1)
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References (2)
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