Phase analysis in α-Fe after high-dose Si ion implantation by depth-selective conversion-electron Mössbauer spectroscopy (DCEMS)

Hyperfine Interactions

Volumn 126, Issue 1-4, 2000, Pages 219-222

  Walterfang, M ^a   Kruijer, S ^a   Dobler, M ^b   Reuther, H ^b   Keune, W ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

IRON; SILICON;

AUGER ELECTRON SPECTROSCOPY; CONFERENCE PAPER; ENERGY; IMPLANTATION; ISOMERISM; MAGNETISM; MOSSBAUER SPECTROSCOPY; PHASE TRANSITION; PHYSICAL PHASE; TEMPERATURE;

EID: 0034452980     PISSN: 03043843     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1012646023250     Document Type: Conference Paper

References (15)