Study of dry photoresist stripping processes for hydrogen silsesquioxane thin films

Materials Research Society Symposium-Proceedings

Volumn 612, Issue , 2000, Pages D5111-D5116

  Liou, Huey Chiang ^a   Duel, Jerry ^a   Finch, Victor ^a   Han, Qingyuan ^b   Sakthivel, Palani ^b   Ruffin, Ricky ^b  

^a DOW CORNING CORPORATION   (United States)

^b EATON CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PERMITTIVITY; PHOTORESISTORS; PRESSURE EFFECTS; STRIPPING (REMOVAL); THERMAL EFFECTS; THERMOOXIDATION; THIN FILMS; ULSI CIRCUITS;

DRY STRIPPING;

HYDROGEN INORGANIC COMPOUNDS;

EID: 0034431053     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-612-d5.11.1     Document Type: Article

References (9)