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Volumn 186, Issue 4-6, 2000, Pages 259-263

Influence of multiple-exposure recording on curvature pattern using multi-aperture speckle shear interferometry

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETRY; SPECKLE;

EID: 0034430234     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(00)01072-5     Document Type: Article
Times cited : (11)

References (9)
  • 2
    • 0002985532 scopus 로고
    • R.S. Sirohi (Ed.), Marcel Dekker, New York, Chapter 2
    • P.K. Rastogi, in: R.S. Sirohi (Ed.), Speckle Metrology, Marcel Dekker, New York, 1993, p. 41 (Chapter 2).
    • (1993) Speckle Metrology , pp. 41
    • Rastogi, P.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.