Suppression of plasma damage on SnO2 by means of a different surface chemistry using dichlorosilane

Materials Research Society Symposium-Proceedings

Volumn 609, Issue , 2000, Pages A3051-A3056

  Nakashima, T ^a   Kondo, M ^a   Toyoshima, Y ^a   Matsuda, A ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY GAP; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SILANES; SILICON; SOLAR CELLS; SURFACE CHEMISTRY; THERMAL EFFECTS;

PLASMA INDUCED DAMAGE;

TIN COMPOUNDS;

EID: 0034428312     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-609-a30.5     Document Type: Article

References (2)