Investigation of large area gratings fabricated by ultrafast e-beam writing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4231, Issue , 2000, Pages 116-125

  Kley, E B ^a   Clausnitzer, T ^a   Cumme, M ^a   Zoellner, K ^a   Schnabel, B ^a   Stich, A ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; ELECTRON BEAM LITHOGRAPHY; ETCHING; HOLOGRAPHY; MASKS; ULTRAFAST PHENOMENA;

BINARY GRATINGS; ELECTRON BEAM WRITING; FILL FACTOR MEASUREMENT;

DIFFRACTION GRATINGS;

EID: 0034427688     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.402775     Document Type: Conference Paper

References (8)