Kinetic Analysis of the Chemical Processes in the Decomposition of Gaseous Dielectrics by a Non-Equilibrium Plasma - Part 1: CF4 and CF4/O2

Journal of the Brazilian Chemical Society

Volumn 11, Issue 2, 2000, Pages 121-128

  Bauerfeldt, Glauco F ^a   Arbilla, Graciela ^a  

^a FEDERAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

CF4 decomposition; Rate of production analysis; Sensitivity analysis

Indexed keywords

EID: 0034409215     PISSN: 01035053     EISSN: None     Source Type: Journal    
DOI: 10.1590/S0103-50532000000200004     Document Type: Article

References (35)

1. Mogab, C. J.; Adams, A. C.; Flamm, D. L. J. Appl. Phys. 1976, 49 , 3796.
2. Kushner, M. J. J. Appl. Phys. 1982, 53, 2923.
3. Edelson, D.; Flamm, D. L. J. Appl. Phys. 1984, 56, 1522.
4. Plumb, I. C.; Ryan, K. R. Plasma Chem. Plasma Process. 1986, 6, 205.
5. Ryan, K. R.; Plumb, I. C. Plasma Chem. Plasma Process. 1986, 6 , 233.
6. Plumb, I. C.; Ryan, K. R. Plasma Chem. Plasma Process. 1986, 6, 247.
7. Kline, L.E. IEEE Trans. Plasma Sci. 1986, PS-14 , 145.
8. Anderson, H. M.; Merson, J. A.; Light, R. W. IEEE Trans. Plasma Sci. 1986, PS-14, 156.
9. Venkatesan, S. P.; Trachtenberg, I.; Edgard, T. F. J. Electrochem. Soc. 1987, 134 , 3194.
10. Ryan, K. R. Plasma Chem. Plasma Process. 1989, 9, 483.
11. Economou, D. J.; Park, S. K.; Williams, G. J. Electrochem. Soc. 1987, 134, 3194.
12. Venkatesan, S. P.; Edgard, T. F.; Trachtenberg, I. J. Electrochem. Soc. 1989, 136 , 536.
13. Ryan, K. R.; Plumb, I. C. Plasma Chem. Plasma Process. 1990, 10 , 207.
14. Lii, Y. J.; Jorné, J.; Cadien, K. C.; Schoenholtz Jr., J. E. J. Electrochem. Soc. 1990 , 137, 3633.
15. Park, S. K.; Economou, D. J. J. Electrochem. Soc. 1991, 138, 1499.
16. Kopalidis, P. M.; Jorné, J. J. Electrochem. Soc. 1993, 140 , 3037.
17. Khairallah, Y.; Khonsari-Arefi, F.; Amouroux, J. Pure Appl. Chem. 1994, 66 , 1353.
18. Bauerfeldt, G. F.; Arbilla, G. Quím. Nova 1998, 21, 25.
19. Manos, D. M.; Flamm, D. L. Plasma Etching: An Introduction; Academic Press; San Diego, CA, 1989.
20. Ryan, K.R.; Plumb, I.C.; Crit. Rev. Solid State Mater. Sci. 1988, 15 , 153.
21. Finlayson-Pitts, B. J.; Pitts Jr., J. S. Atmospheric Chemistry: Fundamentals and Experimental Techniques; John Willey & Sons ; New York, 1986.
22. Smolinsky, G.; Flamm, D. L. J. Appl. Phys. 1979, 50, 4982.
23. d'Agostino, R.; Flamm, D. L. J. Appl. Phys. 1981, 52, 162.
24. Kaps, P.; Rentrop, P. Numer. Math. 1979 , 33, 55.
25. (a) Turányi, T. Comput. Chem. 1990, 14, 3, 253.
26. (b) Turányi, T. J. Math. Chem. 1990, 5, 203.
27. (a) Steinfeld, J. I.; Francisco, J. S.; Hase, W. L. Chemical Kinetics and Dynamics; Prentice Hall, Englewood Cliffs; New Jersey, 1989.
28. (b) Pilling, M. J.; Smith, I. W. M. Modern Gas Kinetics. Theory, Experiment and Application Blackwell Scientific Publications; Oxford, 1987.
29. (c) Hirst, D. M. A Computational Aproach to Chemistry; Blackwell Scientific Publications; Oxford, 1990.
30. Valkó, P.; Vajda, S. Comput. Chem. 1984, 8, 255.
31. Winters, H. F.; Inokuti, M. Phys. Rev. 1982, A25, 1420.
32. Hunter, S. R.; Christophorou, L. G. J. Chem. Phys. 1984, 80, 6150.
33. Flamm, D. L. J. Appl. Phys. 1980, 51, 5688.
34. Flamm, D. L. Donnelly, V. M. Plasma Chem. Plasma Process. 1981, 1, 317.
35. ij coefficients.