Novel selective etching method for silicon nitride films on silicon substrates by means of subcritical water

Industrial and Engineering Chemistry Research

Volumn 39, Issue 12, 2000, Pages 4684-4688

  Morita, Kiyoyuki ^a   Ohnaka, Kiyoshi ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMATOGRAPHY; ETCHING; INFRARED SPECTROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; SILICON NITRIDE; SUBSTRATES; THERMAL EFFECTS;

SELECTIVE ETCHING METHOD; SUBCRITICAL WATER;

SUPERCRITICAL FLUID EXTRACTION;

PHOSPHORIC ACID; SILICON DERIVATIVE; WATER;

CLEANING; CONFERENCE PAPER; INFRARED SPECTROSCOPY; ION PAIR CHROMATOGRAPHY; TEMPERATURE;

EID: 0034405431     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie000127x     Document Type: Conference Paper

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