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Volumn 17, Issue 3, 2000, Pages 299-303

Preparation of Ultra-fine Alumina Powders by D. C. Plasma Jet

Author keywords

Phase Transition; Plasma Synthesis; Rapid Quenching; Reactor Configuration; Ultra fine Powder

Indexed keywords


EID: 0034388890     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02699044     Document Type: Article
Times cited : (14)

References (12)
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  • 5
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    • Formation of Aluminum Nitrides in Thermal Plasmas
    • Etemadi, K., "Formation of Aluminum Nitrides in Thermal Plasmas," Plasma Chemistry and Plasma Process, 11(1), 41 (1991).
    • (1991) Plasma Chemistry and Plasma Process , vol.11 , Issue.1 , pp. 41
    • Etemadi, K.1
  • 6
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    • Deposition from the Vapor Pressure during Induction Plasma Treatment of Alumina Powders
    • Ishigaki, T., Bando, Y., Moriyoshi, Y. and Baulos, M. I., "Deposition from the Vapor Pressure during Induction Plasma Treatment of Alumina Powders," J. Mat. Sci., 28, 4223 (1993).
    • (1993) J. Mat. Sci. , vol.28 , pp. 4223
    • Ishigaki, T.1    Bando, Y.2    Moriyoshi, Y.3    Baulos, M.I.4
  • 7
    • 0000712908 scopus 로고
    • Plasma Synthesis of Ceramic Powders
    • Kong, P. C. and Lau, Y. C., "Plasma Synthesis of Ceramic Powders," Pure Appl. Chem., 62(9), 1809 (1990).
    • (1990) Pure Appl. Chem. , vol.62 , Issue.9 , pp. 1809
    • Kong, P.C.1    Lau, Y.C.2
  • 8
    • 0348095541 scopus 로고    scopus 로고
    • Synthesis of Ultra-fine Powders of AIN by Thermal Plasma
    • Oh, S.-M. and Park, D.-W., "Synthesis of Ultra-fine Powders of AIN by Thermal Plasma," HWAHAK KONGHAK, 35, 249 (1997).
    • (1997) HWAHAK KONGHAK , vol.35 , pp. 249
    • Oh, S.-M.1    Park, D.-W.2
  • 9
    • 0032022228 scopus 로고    scopus 로고
    • Preparation of AIN Fine Powder by Thermal Processing
    • Oh, S.-M. and Park, D.-W., "Preparation of AIN Fine Powder by Thermal Processing," Thin Solid Films, 316, 189 (1998).
    • (1998) Thin Solid Films , vol.316 , pp. 189
    • Oh, S.-M.1    Park, D.-W.2
  • 10
    • 0033246023 scopus 로고    scopus 로고
    • Thermal Plasma Technology; Where Do We Stand and Where Are We Going?
    • Pfender, E., "Thermal Plasma Technology; Where Do We Stand and Where Are We Going?," Plasma Chemistry and Plasma Processing, 19, 19 (1999).
    • (1999) Plasma Chemistry and Plasma Processing , vol.19 , pp. 19
    • Pfender, E.1
  • 11
    • 84916592492 scopus 로고
    • Nanophase Materials Assembled from Atomic Cluster
    • Siegel, R. W., "Nanophase Materials Assembled from Atomic Cluster," MRS Bull., 15, 60 (1990).
    • (1990) MRS Bull. , vol.15 , pp. 60
    • Siegel, R.W.1
  • 12
    • 0030165782 scopus 로고    scopus 로고
    • Investigating the Thermal Plasma Processing of Advanced Materials
    • Taylor, P. R. and Manrique, M., "Investigating the Thermal Plasma Processing of Advanced Materials," JOM, 48, 43 (1996).
    • (1996) JOM , vol.48 , pp. 43
    • Taylor, P.R.1    Manrique, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.