Frustrations in polymer conformation in gels and their minimization through molecular imprinting

Physical Review Letters

Volumn 85, Issue 23, 2000, Pages 5000-5003

  Enoki, Takashi ^a   Tanaka, Kazunori ^a   Watanabe, Tsuyoshi ^a   Oya, Taro ^a   Sakiyama, Takaharu ^a   Takeoka, Yukikazu ^a   Ito, Kenji ^a   Wang, Guoqiang ^a   Annaka, Masahiko ^a   Hara, Kazuhiro ^a   Du, Rose ^a   Chuang, Jeffrey ^a   Wasserman, Kevin ^a   Grosberg, Alexander Yu ^b   Masamune, Satoru ^c   Tanaka, Toyoichi ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b University of Minnesota   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMATIONS; CROSSLINKING; MOLECULES; MONOMERS; NEGATIVE IONS; POLYMERIZATION; POSITIVE IONS;

MOLECULAR IMPRINTING; POST CROSS LINKING PROCESS; TARGET MOLECULES;

GELS;

ARYLSULFONIC ACID DERIVATIVE; CROSS LINKING REAGENT; POLYMER; PYRANINE;

ARYLSULFONATES; CROSS-LINKING REAGENTS; POLYMERS;

EID: 0034351061     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.85.5000     Document Type: Article

References (16)

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