Polarity effects of substrate surface in homoepitaxial ZnO film growth

Journal of Crystal Growth

Volumn 219, Issue 4, 2000, Pages 361-367

  Zhu, Shen ^a   Su, C H ^a   Lehoczky, S L ^a   Harris, M T ^b   Callahan, M J ^b   McCarty, P ^c   George, M A ^c  

^a NASA MARSHALL SPACE FLIGHT CENTER   (United States)

^b AIR FORCE RESEARCH LABORATORY   (United States)

^c UNIVERSITY OF ALABAMA IN HUNTSVILLE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; EPITAXIAL GROWTH; MAGNETRON SPUTTERING; MORPHOLOGY; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR GROWTH; SINGLE CRYSTALS; SPUTTER DEPOSITION; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

HOMOEPITAXIAL FILMS; OFF-AXIS MAGNETRON SPUTTERING DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0034325347     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(00)00726-0     Document Type: Article

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