Analysis of metals in the non-volatile residue of liquid phase WF6

Journal of analytical atomic spectrometry

Volumn 15, Issue 11, 2000, Pages 1474-1478

  Witcofsky, J R ^a   Ketkar, S N ^a   George, M A ^a   Kahr, J C ^a  

^a AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; EVAPORATION; HYDROFLUORIC ACID; NITRIC ACID; SOLUTIONS; TUNGSTEN COMPOUNDS;

TUNGSTEN HEXAFLUORIDE;

MASS SPECTROMETRY;

EID: 0034321357     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/b001331p     Document Type: Article

References (6)

1. R. V. Joshi, S. Basaiah, L. Hsu and M. Jaso, in Advanced Metallization for ULSI Applications, ed. V. V. S. Rana, R. V. Joshi and I. Ohdomari, Materials Research Society, 1992.
2. Semiconductor Equipment Manufacturers International (SEMI) Book of Standards.
3. B. J. Streussand, V. E. Yost, S. W. Govorchin, R. C. Fry, F. J. Padula and S. K. Hughes, Mat. Res. Soc. Symp. Proc. VLSI V, Material Research Society, 1990, pp. 251-255.
4. R. L. Sutton, J. Anal. At. Spectrom., 1994, 9, 1079.
5. W. Saab, A. Sarda and G. Cote, Anal. Chim. Acta, 1991, 248, 235.
6. The URL to download free software to calculate the LODs is http://www.airproducts.com/gases/mdl-estimator/.