-
2
-
-
0006832740
-
Review on preparation of films of functional complex oxide by hydrothermal-electrochemical method
-
S. E. Yoo, N. Ishizawa, M. Hayashi, and M. Yoshimura, "Review on Preparation of Films of Functional Complex Oxide by Hydrothermal-Electrochemical Method," Rep. Res. Lab. Eng. Mater., Tokyo Inst. Technol., 16, 39-53 (1991).
-
(1991)
Rep. Res. Lab. Eng. Mater., Tokyo Inst. Technol.
, vol.16
, pp. 39-53
-
-
Yoo, S.E.1
Ishizawa, N.2
Hayashi, M.3
Yoshimura, M.4
-
3
-
-
0029403322
-
3 films on zirconium metal, microstructure, XPS and AES depth profiling
-
3 Films on Zirconium Metal, Microstructure, XPS and AES Depth Profiling," J. Mater. Res., 10, 2749 (1995).
-
(1995)
J. Mater. Res.
, vol.10
, pp. 2749
-
-
Fuenzalida, V.M.1
Pilleux, M.E.2
-
4
-
-
0029404443
-
4 film by an electrochemical method
-
4 Film by an Electrochemical Method," J. Am. Ceram. Soc, 78 [11] 3110-12 (1995).
-
(1995)
J. Am. Ceram. Soc
, vol.78
, Issue.11
, pp. 3110-3112
-
-
Cho, W.-S.1
Yashima, M.2
Kakihana, M.3
Kudo, A.4
Sakata, T.5
Yoshimura, M.6
-
5
-
-
0031238338
-
4 solid-solution films by an electrochemical method at room temperature and their luminescence
-
4 Solid-Solution Films by an Electrochemical Method at Room Temperature and Their Luminescence," J. Am. Ceram. Soc., 80 [9] 2464-66 (1997).
-
(1997)
J. Am. Ceram. Soc.
, vol.80
, Issue.9
, pp. 2464-2466
-
-
Yoshimura, M.1
Ohmura, M.2
Cho, W.-S.3
Yashima, M.4
Kakihana, M.5
-
6
-
-
0029308143
-
3 thin films on Si(100) substrates by low-temperature processing
-
3 Thin Films on Si(100) Substrates by Low-Temperature Processing," Mater. Lett., 23, 203 (1995).
-
(1995)
Mater. Lett.
, vol.23
, pp. 203
-
-
Cho, C.R.1
Jang, M.S.2
Jeong, S.Y.3
Lee, S.J.4
Lim, B.M.5
-
7
-
-
0031101009
-
3 thin-film grown by the hydrothermal-electrochemical method
-
3 Thin-Film Grown by the Hydrothermal-Electrochemical Method," Jpn. J. Appl. Phys., Part 1, 36, 1209-15 (1997).
-
(1997)
Jpn. J. Appl. Phys., Part 1
, vol.36
, pp. 1209-1215
-
-
Kajiyoshi, K.1
Sakabe, Y.2
Yoshimura, M.3
-
9
-
-
0029325396
-
3 (A = Ba, Sr) thin-film growth by hydrothermal-electrochemical method
-
3 (A = Ba, Sr) Thin-Film Growth by Hydrothermal-Electrochemical Method," J. Am. Ceram. Soc., 78 [6] 1521-31 (1995).
-
(1995)
J. Am. Ceram. Soc.
, vol.78
, Issue.6
, pp. 1521-1531
-
-
Kajiyoshi, K.1
Tomono, K.2
Hamaji, Y.3
Kasanami, T.4
-
11
-
-
0032165754
-
3 films grown under hydrothermal conditions
-
3 Films Grown Under Hydrothermal Conditions," Appl. Surf. Sci., 134 [1-4] 225-28 (1998).
-
(1998)
Appl. Surf. Sci.
, vol.134
, Issue.1-4
, pp. 225-228
-
-
Lisoni, J.G.1
Piera, F.J.2
Sánchez, M.3
Soto, C.F.4
Fuenzalida, V.M.5
-
12
-
-
0030784735
-
3 films: Electrochemical characterization of the early growth stages
-
3 Films: Electrochemical Characterization of the Early Growth Stages," J. Am. Ceram. Soc., 80, 213-18 (1997).
-
J. Am. Ceram. Soc.
, vol.80
, Issue.1997
, pp. 213-218
-
-
Vargas, T.1
Díaz, H.2
Silva, C.I.3
Fuenzalida, V.M.4
-
14
-
-
0001428826
-
Techniques for nucleation analysis in metal electrodeposition
-
Edited by R. Varma and R. Selman. Wiley, New York
-
T. Vargas and R. Varma, "Techniques for Nucleation Analysis in Metal Electrodeposition"; pp. 717-60 in Techniques for the Characterization of Electrochemical Processes. Edited by R. Varma and R. Selman. Wiley, New York, 1991.
-
(1991)
Techniques for the Characterization of Electrochemical Processes
, pp. 717-760
-
-
Vargas, T.1
Varma, R.2
-
16
-
-
0023313199
-
Controlled nucleation and growth in chromium electroplating from molten LiCl-KCl
-
T. Vargas and D. Inman, "Controlled Nucleation and Growth in Chromium Electroplating from Molten LiCl-KCl," J. Appl. Electrochem, 17, 270-82 (1987).
-
(1987)
J. Appl. Electrochem
, vol.17
, pp. 270-282
-
-
Vargas, T.1
Inman, D.2
-
17
-
-
0006759289
-
3 thin films hy grazing angle incidence X-ray diffraction analysis
-
3 Thin Films hy Grazing Angle Incidence X-ray Diffraction Analysis," Rep. Res. Lab. Eng. Mater., Tokyo Inst. Technol., 16, 9-14 (1991).
-
(1991)
Rep. Res. Lab. Eng. Mater., Tokyo Inst. Technol.
, vol.16
, pp. 9-14
-
-
Ishizawa, N.1
Hayashi, M.2
Banno, H.3
Mizunuma, S.4
Yamaguchi, H.5
Yoo, S.-E.6
Yoshimura, M.7
|