Effect of various sputtering parameters on Ta phase formation using an I-Optimal experimental design

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2842-2847

  Whitman, Charles S ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; FILM GROWTH; HIGH TEMPERATURE EFFECTS; MATHEMATICAL MODELS; PHASE COMPOSITION; SPUTTER DEPOSITION; TANTALUM;

FILM RESISTIVITY; PHASE FORMATION; SPUTTERING TEMPERATURE;

THIN FILMS;

EID: 0034317841     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319701     Document Type: Article

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