Preparation of oxide thin films by controlled diffusion of oxygen atoms

Solid State Ionics

Volumn 136-137, Issue , 2000, Pages 921-926

  Rosenstock, Z ^a   Riess, I ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER OXIDES; DIFFUSION IN SOLIDS; ELECTRIC RESISTANCE; MECHANICAL PERMEABILITY; OXIDATION; OXYGEN; SILVER; THIN FILMS;

COPPER OXIDE;

METALLIC FILMS;

EID: 0034316649     PISSN: 01672738     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-2738(00)00570-1     Document Type: Article

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