High-purity, ultrahigh-resolution calixarene electron-beam negative resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3424-3427

  Manako, Shoko ^a   Ochiai, Yukinori ^a   Yamamoto, Hiromasa ^b   Teshima, Takahiro ^c   Fujita, Jun Ichi ^a   Nomura, Eiichi ^a  

^a NEC CORPORATION   (Japan)

^b TOKUYAMA CORPORATION   (Japan)

^c Clariant Tokuyama Limited   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MOLECULAR WEIGHT; SEMICONDUCTING SILICON; SURFACE ROUGHNESS;

CALIXARENE;

PHOTORESISTS;

EID: 0034316535     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321274     Document Type: Article

References (13)

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