Reaction of copper oxide and β-diketone for in situ cleaning of metal copper in a copper chemical vapor deposition reactor

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 11, 2000, Pages 6478-6486

  Sekiguchi, Atsushi ^a   Kobayashi, Akiko ^a   Koide, Tomoaki ^a   Okada, Osamu ^a   Hosokawa, Naokichi ^a  

^a Canon ANELVA Technix Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; COMPLEXATION; COPPER OXIDES; ETCHING; THERMAL EFFECTS; THERMOGRAVIMETRIC ANALYSIS; VAPORIZATION;

INNER REACTOR WALLS;

CHEMICAL VAPOR DEPOSITION;

EID: 0034315997     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6478     Document Type: Article

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