Effects of fluorocarbon polymer deposition on the selective etching of SiO2/photoresist in high density plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2763-2768

  Chu, Changwoong ^a   Ahn, Taehyuk ^a   Kim, Jisoo ^a   Jeong, Sangsup ^a   Moon, Jootae ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DEPOSITION; ETCHING; FLUOROCARBONS; SILICA; STOICHIOMETRY;

HIGH DENSITY PLASMA;

PHOTORESISTS;

EID: 0034315945     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1322046     Document Type: Article

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