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Volumn 376, Issue 1-2, 2000, Pages 264-266
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Critical exponents of diamond films: Possible influence of spatially correlated noise
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CORRELATION METHODS;
FILM GROWTH;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SPURIOUS SIGNAL NOISE;
SURFACE ROUGHNESS;
SYNTHESIS (CHEMICAL);
KARDAR-PARISI-ZHANG EQUATIONS;
PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION;
DIAMOND FILMS;
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EID: 0034315601
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)01400-0 Document Type: Article |
Times cited : (12)
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References (10)
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