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Volumn 12, Issue 22, 2000, Pages 285-288
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High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPOSITION;
COPPER COMPOUNDS;
ELECTRIC CONDUCTIVITY;
ENERGY ABSORPTION;
ENERGY DISPERSIVE SPECTROSCOPY;
HALL EFFECT;
PHOTOELECTRON SPECTROSCOPY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTOR JUNCTIONS;
TEMPERATURE;
THICKNESS MEASUREMENT;
X RAY DIFFRACTION ANALYSIS;
COPPER ALUMINUM OXIDE;
INDIUM TIN OXIDE;
OPTICAL BANDGAPS;
SEMICONDUCTOR MATERIALS;
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EID: 0034314839
PISSN: 09359648
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (4)
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References (12)
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