Determination of kinetic energy distribution in a laser-ablated titanium plume by emission and laser-induced fluorescence spectroscopy

Journal of Heat Transfer

Volumn 122, Issue 4, 2000, Pages 771-775

  Chu, S S ^a   Grigorpoulos, C P ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Ablation; Heat transfer; Laser; Thin films

Indexed keywords

FILM; HEAT TRANSFER; KINETICS; PLUME;

AXIAL FLOW; DEPOSITION; EMISSION SPECTROSCOPY; FLUORESCENCE; HEAT TRANSFER; KINETIC ENERGY; LASER ABLATION; PRESSURE EFFECTS; PULSED LASER DEPOSITION; THIN FILMS; TITANIUM;

FLUORESCENCE SPECTROSCOPY; LASER INDUCED FLUORESCENCE (LIF); TITANIUM PLUMES;

METALLIC FILMS;

EID: 0034313275     PISSN: 00221481     EISSN: None     Source Type: Journal    
DOI: 10.1115/1.1318214     Document Type: Article

References (9)

1. Barrier layers: The advantages of titanium nitride
2. Epitaxial growth of TiN films on (100) silicon substrates by laser physical vapor deposition
3. Structure and properties of TiN coatings
4. Selective transmission of thin TiN-films
5. Atomic transition probabilities for scandium and titanium
6. Plasma diagnostics in pulsed laser TiN layer deposition
7. Reconsidering the mechanisms of laser sputtering with knudsen-Layer formation taken into account
8. Dynamics of plume propagation and splitting during pulsed-laser ablation