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Volumn 133-134, Issue , 2000, Pages 121-125
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Comparison of substrate temperature and deposition rate between modified pulsed arc process and d.c. arc process
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Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION;
ELECTRIC CURRENTS;
MATHEMATICAL MODELS;
PULSED ARC PROCESS;
VACUUM ARC DEPOSITION;
VACUUM DEPOSITED COATINGS;
CATHODIC ARC PLASMA DEPOSITION;
COATING;
DEPOSITION;
HIGH TEMPERATURE CORROSION;
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EID: 0034310608
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(00)00885-9 Document Type: Article |
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Times cited : (15)
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References (8)
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