Method and experimental arrangement for Al thin film deposition from r.f. metal plasma with simultaneous self-ion bombardment

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 170, Issue 3, 2000, Pages 375-384

  Mohnjuk, A A ^a   Gusev, I V ^a   Belevsky, V P ^a  

^a Kiev Res Institute for Microdevices   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; COMPUTER SIMULATION; DEPOSITION; ELECTRON BEAMS; EVAPORATION; ION BOMBARDMENT; IONIZATION OF GASES; PLASMA APPLICATIONS; THIN FILMS;

PLASMA DEPOSITION; SIMULTANEOUS SELF-ION BOMBARDMENT;

METALLIC FILMS;

EID: 0034301501     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00252-4     Document Type: Article

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