Soft lithography approach to the fabrication of nanostructures of single crystalline silicon with well-defined dimensions and shapes

Advanced Materials

Volumn 12, Issue 19, 2000, Pages 1426-1430

  Yin, Yadong ^b   Gates, Byron ^a   Xia, Younan ^a  

^a UNIVERSITY OF WASHINGTON   (United States)

^b University of Washington   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON ON INSULATOR TECHNOLOGY; SINGLE CRYSTALS;

CONTROL DIMENSIONS; NEAR FIELD OPTICAL LITHOGRAPHY; NEAR FIELD PATTERNING;

SEMICONDUCTING SILICON;

EID: 0034301136     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(200010)12:19<1426::aid-adma1426>3.0.co;2-b     Document Type: Article

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