Charged dust in processing plasma sheath

Vacuum

Volumn 59, Issue 1, 2000, Pages 126-134

  Liu, Jin Yuan ^a   Wang, Dezhen ^a   Ma, T C ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; CHARGED PARTICLES; ELECTRON BEAMS; MATHEMATICAL MODELS; PLASMA SHEATHS;

CHARGED DUSTS; ION LOSS CHARGING;

VACUUM TECHNOLOGY;

EID: 0034300707     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00262-1     Document Type: Article

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