Lateral oxidation of AlAs layers at elevated water vapour pressure using a closed-chamber system

Semiconductor Science and Technology

Volumn 15, Issue 10, 2000, Pages

  Choe, Joong Seon ^a   Park, Si Hyun ^a   Choe, Byung Doo ^a   Jeon, Heonsu ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

OXIDATION; SATURATION (MATERIALS COMPOSITION); SEMICONDUCTING FILMS; VAPOR PRESSURE; WATER;

CLOSED-CHAMBER SYSTEMS; LATERAL OXIDATION;

SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 0034300399     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/15/10/102     Document Type: Article

References (11)

1. Huffaker D L, Deppe D G, Kumar K and Rogers T J 1994 Appl. Phys. Lett. 65 97 Lear K L, Choquette K D, Schneider R P Jr, Kilcoyne S P and Geib K M 1995 Electron. Lett. 31 208
2. Huffaker D L, Deppe D G, Kumar K and Rogers T J 1994 Appl. Phys. Lett. 65 97 Lear K L, Choquette K D, Schneider R P Jr, Kilcoyne S P and Geib K M 1995 Electron. Lett. 31 208
3. Chen E I, Holonyak N Jr and Maranowski S A 1995 Appl. Phys. Lett. 66 2688
4. Holmes A L, Islam M R, Chelakara R V, Ciuba F J, Dupuis R D, Ries M J, Chen E I, Maranowski S A and Holonyak N Jr 1995 Appl. Phys. Lett. 66 2831
5. Choe J-S, Ryu S-W, Choe B-D and Lim H 1998 J. Appl. Phys. 83 5779
6. Gebretsadik H, Kamath K, Zhou W D, Bhattacharya P, Caneau C and Bhat R 1998 Appl. Phys. Lett. 72 135
7. Takamori T, Takemasa K and Kamijoh T 1996 Appl. Phys. Lett. 69 659
8. Ashby C I H, Bridges M M, Allerman A A and Hammons B E 1999 Appl. Phys. Lett. 75 73
9. Handbook of Chemistry and Physics 1994 (Boca Raton, FL: Chemical Rubber Company)
10. Deal B E and Grove A S 1965 J. Appl. Phys. 36 3770
11. Lee J K, Lee K-H and Shin H K 2000 Private communication