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Volumn 23, Issue 12, 2000, Pages 66-68,-71
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CMP battles low-fundamental barriers
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
ABRASIVES;
ALUMINUM;
CAPACITANCE;
CHEMICAL POLISHING;
COPPER;
ELECTRIC POTENTIAL;
LITHOGRAPHY;
OXIDES;
SEMICONDUCTOR DEVICE STRUCTURES;
SURFACE TOPOGRAPHY;
TUNGSTEN;
CHEMICAL MECHANICAL POLISHING;
LOW SELECTIVITY SLURRY;
SOFT ORGANIC POLYMER;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0034300255
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (1)
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References (0)
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