Photodissociation of O3 around 309 nm

Journal of Physical Chemistry A

Volumn 104, Issue 39, 2000, Pages 8936-8944

  Taniguchi, Nori ^a   Takahashi, Kenshi ^a   Matsumi, Yutaka ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; FLUORESCENCE; LASER BEAM EFFECTS; MODELS; PHOTODISSOCIATION; PHOTOLYSIS; PHOTONS; REACTION KINETICS; SPECTROSCOPIC ANALYSIS; TEMPERATURE; ULTRAVIOLET RADIATION;

PHOTOFRAGMENT EXCITATION; THERMODYNAMIC THRESHOLD; ULTRAVIOLET PHOTON EXCITATION; VACUUM ULTRAVIOLET LASER INDUCED FLUORESCENCE SPECTROSCOPY;

OZONE;

EID: 0034300077     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp001706i     Document Type: Article

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