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Volumn 86, Issue 1-2, 2000, Pages 103-107

Detailed characterization of anodic bonding process between glass and thin-film coated silicon substrates

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; BONDING; COATINGS; GLASS; IONS; SEMICONDUCTING SILICON; SODIUM; SUBSTRATES; SURFACE PROPERTIES; THERMAL EFFECTS; THIN FILMS;

EID: 0034297824     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(00)00418-0     Document Type: Article
Times cited : (93)

References (9)
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    • Schmidt M.A. Wafer-to wafer bonding for microstructure formation. Proc. IEEE. 86(8):1998;1574-1585. August.
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    • Schmidt, M.A.1
  • 2
    • 0029325927 scopus 로고
    • Characterization of the electrostatic bonding of silicon and pyrex glass
    • Cozma A., Puers B. Characterization of the electrostatic bonding of silicon and pyrex glass. J. Micromech. Microeng. 5:1995;98-102.
    • (1995) J. Micromech. Microeng. , vol.5 , pp. 98-102
    • Cozma, A.1    Puers, B.2
  • 3
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    • Anodic bonding of silicon to silicon wafers coated with aluminium, silicon oxide, polysilicon or silicon nitride
    • Nese M., Hanneborg A. Anodic bonding of silicon to silicon wafers coated with aluminium, silicon oxide, polysilicon or silicon nitride. Sens. Actuators, A. 37-38:1993;61-67.
    • (1993) Sens. Actuators, a , vol.3738 , pp. 61-67
    • Nese, M.1    Hanneborg, A.2
  • 4
    • 0033537532 scopus 로고    scopus 로고
    • Experimental evaluation of anodic bonding process based on the Taguchi analysis of interfacial fracture toughness
    • Go J.S., Cho Y.H. Experimental evaluation of anodic bonding process based on the Taguchi analysis of interfacial fracture toughness. Sens. Actuators, A. 73:1999;52-57.
    • (1999) Sens. Actuators, a , vol.73 , pp. 52-57
    • Go, J.S.1    Cho, Y.H.2
  • 5
    • 0042137051 scopus 로고    scopus 로고
    • Low-temperature bonding of silicon and silicon dioxide by the surface activation method
    • Takagi H., Maeda R., Chung T.R., Suga T. Low-temperature bonding of silicon and silicon dioxide by the surface activation method. Sens. Actuators, A. 70:1998;164-170.
    • (1998) Sens. Actuators, a , vol.70 , pp. 164-170
    • Takagi, H.1    Maeda, R.2    Chung, T.R.3    Suga, T.4
  • 7
    • 0014867997 scopus 로고
    • Direct-current polarization during field-assisted glass-metal sealing
    • October
    • Wallis G. Direct-current polarization during field-assisted glass-metal sealing. J. Am. Ceram. Soc. 53(10):1970;563-567. October.
    • (1970) J. Am. Ceram. Soc. , vol.53 , Issue.10 , pp. 563-567
    • Wallis, G.1
  • 8
    • 0022767042 scopus 로고
    • A field-assisted bonding process for silicon dielectric isolation
    • August
    • Frye R.C., Griffith J.E., Wong Y.H. A field-assisted bonding process for silicon dielectric isolation. J. Electrochem. Soc. 133(8):1986;1673-1677. August.
    • (1986) J. Electrochem. Soc. , vol.133 , Issue.8 , pp. 1673-1677
    • Frye, R.C.1    Griffith, J.E.2    Wong, Y.H.3
  • 9
    • 0029234140 scopus 로고
    • Selection of glass, anodic bonding conditions and material compatibility for silicon-glass capacitive sensors
    • Rogers T., Kowal J. Selection of glass, anodic bonding conditions and material compatibility for silicon-glass capacitive sensors. Sens. Actuators, A. 46-47:1995;113-120.
    • (1995) Sens. Actuators, a , vol.4647 , pp. 113-120
    • Rogers, T.1    Kowal, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.