-
1
-
-
0032136370
-
Wafer-to wafer bonding for microstructure formation
-
August
-
Schmidt M.A. Wafer-to wafer bonding for microstructure formation. Proc. IEEE. 86(8):1998;1574-1585. August.
-
(1998)
Proc. IEEE
, vol.86
, Issue.8
, pp. 1574-1585
-
-
Schmidt, M.A.1
-
2
-
-
0029325927
-
Characterization of the electrostatic bonding of silicon and pyrex glass
-
Cozma A., Puers B. Characterization of the electrostatic bonding of silicon and pyrex glass. J. Micromech. Microeng. 5:1995;98-102.
-
(1995)
J. Micromech. Microeng.
, vol.5
, pp. 98-102
-
-
Cozma, A.1
Puers, B.2
-
3
-
-
0027611874
-
Anodic bonding of silicon to silicon wafers coated with aluminium, silicon oxide, polysilicon or silicon nitride
-
Nese M., Hanneborg A. Anodic bonding of silicon to silicon wafers coated with aluminium, silicon oxide, polysilicon or silicon nitride. Sens. Actuators, A. 37-38:1993;61-67.
-
(1993)
Sens. Actuators, a
, vol.3738
, pp. 61-67
-
-
Nese, M.1
Hanneborg, A.2
-
4
-
-
0033537532
-
Experimental evaluation of anodic bonding process based on the Taguchi analysis of interfacial fracture toughness
-
Go J.S., Cho Y.H. Experimental evaluation of anodic bonding process based on the Taguchi analysis of interfacial fracture toughness. Sens. Actuators, A. 73:1999;52-57.
-
(1999)
Sens. Actuators, a
, vol.73
, pp. 52-57
-
-
Go, J.S.1
Cho, Y.H.2
-
5
-
-
0042137051
-
Low-temperature bonding of silicon and silicon dioxide by the surface activation method
-
Takagi H., Maeda R., Chung T.R., Suga T. Low-temperature bonding of silicon and silicon dioxide by the surface activation method. Sens. Actuators, A. 70:1998;164-170.
-
(1998)
Sens. Actuators, a
, vol.70
, pp. 164-170
-
-
Takagi, H.1
Maeda, R.2
Chung, T.R.3
Suga, T.4
-
6
-
-
0025419816
-
The mechanism of field-assisted silicon-glass boning
-
Kanda Y., Matsuda K., Murayama C., Sugaya J. The mechanism of field-assisted silicon-glass boning. Sens. Actuators, A. 21-23:1990;939-943.
-
(1990)
Sens. Actuators, a
, vol.2123
, pp. 939-943
-
-
Kanda, Y.1
Matsuda, K.2
Murayama, C.3
Sugaya, J.4
-
7
-
-
0014867997
-
Direct-current polarization during field-assisted glass-metal sealing
-
October
-
Wallis G. Direct-current polarization during field-assisted glass-metal sealing. J. Am. Ceram. Soc. 53(10):1970;563-567. October.
-
(1970)
J. Am. Ceram. Soc.
, vol.53
, Issue.10
, pp. 563-567
-
-
Wallis, G.1
-
8
-
-
0022767042
-
A field-assisted bonding process for silicon dielectric isolation
-
August
-
Frye R.C., Griffith J.E., Wong Y.H. A field-assisted bonding process for silicon dielectric isolation. J. Electrochem. Soc. 133(8):1986;1673-1677. August.
-
(1986)
J. Electrochem. Soc.
, vol.133
, Issue.8
, pp. 1673-1677
-
-
Frye, R.C.1
Griffith, J.E.2
Wong, Y.H.3
-
9
-
-
0029234140
-
Selection of glass, anodic bonding conditions and material compatibility for silicon-glass capacitive sensors
-
Rogers T., Kowal J. Selection of glass, anodic bonding conditions and material compatibility for silicon-glass capacitive sensors. Sens. Actuators, A. 46-47:1995;113-120.
-
(1995)
Sens. Actuators, a
, vol.4647
, pp. 113-120
-
-
Rogers, T.1
Kowal, J.2
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