Differential capacitive low-g microaccelerometer with m g resolution

Sensors and Actuators, A: Physical

Volumn 86, Issue 1-2, 2000, Pages 45-51

  Tay, Francis E H ^a   Xu, J ^a   Logeeswaran, V J ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CAPACITANCE; DIFFERENTIATING CIRCUITS; ELECTROSTATIC DEVICES; METALLIZING; MICROPROCESSOR CHIPS; OPTICAL RESOLVING POWER; REACTIVE ION ETCHING; SENSITIVITY ANALYSIS; SINGLE CRYSTALS;

AIR GAP; DIFFERENTIAL CAPACITIVE ACCELEROMETERS; ELECTROSTATIC SPRING CONSTANTS;

ACCELEROMETERS;

EID: 0034297494     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(00)00424-6     Document Type: Article

References (13)

1. Chau K.H.-L., Lewis S.R., Zhao Y., Howe R.T., Bart S.F., Marcheselli R.G. An integrated force-balanced capacitance accelerometer for low-g applications. Tranducers'95. 1995;593-596.
2. Lemkin M.A., Boser B.E., Auslander D., Smith J.H. A 3-axis force balanced accelerometer using a single proof-mass. Tranducers'97. 1997;1185-1188.
3. Offenberg M., Munzel H., Schubert D., Schatz O., Larmer F., Muller E., Maihofer B., Mark J. Accelerometer Sensor in Surface Micromachining for Airbag Applications with High Signal/Noise Ratio. 1996;Society of Automotive Engineering. pp. 35-41.
4. Yeh C., Najafi K. CMOS interface circuit for a low-voltage micromachined tunneling accelerometer. J. Microelectromech. Syst. 7:1998;6-15.
5. Soloman S. Sensors Handbook. 1998;McGraw-Hill.
6. Leuthold H., Rudolf F. An ASIC for high-resolution capacitive microaccelerometers. Sens. Actuators A. 1990;278-281.
7. Selvakumar A., Najafi K. A high-sensitivity Z-axis capacitive silicon microaccelerometer with a torsion suspension. J. Microelectromech. Syst. 7:1998;192-200.
8. M.J. Novack, Design and fabrication of a thin film micromachined accelerometer, MSc Thesis, MIT, 1992, 143-144.
9. Shaw K.A., Zhang Z.L., MacDonald N.C. SCREAM I: A single mask, single crystal silicon reactive ion etching and metallization process for micromechanical structure. Sens. Actuators A. 40:1994;63-70.
10. Tay F.E.H., Xu J., Yao Y., Logeeswaran V.J., Bergstrom J.S., Sooriakumar K., Loh Y.H., Sridhar U., Liang Y.C. The Study of Parallel and Oblique in a Differential Capacitive Microaccelerometer ICARCV'98 Singapore. 1998;1612-1616.
11. Yazdi N., Najafi K. An all-silicon single-wafer fabrication technology for precision microaccelerometers. Tranducers'97. 1997;1181-1184.
12. Y.H. Loh , Accelerometer: Sensor and System Design using SCREAM and Trench Oxide Isolation Technologies, Proc. of Int. MEMS Workshop Singapore., (1997) 12-13.
13. Tang W.C.K. Electrostatic Comb Drive Levitation and Control Method. J. of Microelectromech. Syst. 1(4):1992.