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Volumn 36, Issue 21, 2000, Pages 1777-1779

Near ultraviolet optically pumped vertical cavity laser

Author keywords

[No Author keywords available]

Indexed keywords

MIRRORS; MORPHOLOGY; OPTICAL RESONATORS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR QUANTUM WELLS;

EID: 0034297231     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20001257     Document Type: Article
Times cited : (57)

References (6)
  • 1
    • 0033578677 scopus 로고    scopus 로고
    • Room temperature lasing at blue wavelengths in gallium nitride microcavities
    • SOMEYA, T., WERNER, R., FORCHEL, A., CATALANO, M., CINGOLANI, R., and ARAKAWA, Y.: 'Room temperature lasing at blue wavelengths in gallium nitride microcavities', Science, 1999, 285, pp. 1905-1906
    • (1999) Science , vol.285 , pp. 1905-1906
    • Someya, T.1    Werner, R.2    Forchel, A.3    Catalano, M.4    Cingolani, R.5    Arakawa, Y.6
  • 4
    • 0035927009 scopus 로고    scopus 로고
    • Stress engineering during metalorganic chemical vapor deposition of AlGaN/GaN distributed Bragg reflectors
    • submitted
    • WALDRIP, K.E., HAN, J., FIGIEL, J.J., ZHOU, H., DIAGNE, M., and NURMIKKO, A.V.: 'Stress engineering during metalorganic chemical vapor deposition of AlGaN/GaN distributed Bragg reflectors', submitted to Appl. Phys. Lett.,
    • Appl. Phys. Lett.
    • Waldrip, K.E.1    Han, J.2    Figiel, J.J.3    Zhou, H.4    Diagne, M.5    Nurmikko, A.V.6
  • 5
    • 0000397045 scopus 로고    scopus 로고
    • High reflectivity and broad bandwidth AlN/GaN distributed Bragg reflectors grown by molecular-beam epitaxy
    • NG, H.M., MOUSTAKAS, T.D., and CHU, S.N.G.: 'High reflectivity and broad bandwidth AlN/GaN distributed Bragg reflectors grown by molecular-beam epitaxy', Appl. Phys. Lett., 2000, 76, pp. 2818-2820
    • (2000) Appl. Phys. Lett. , vol.76 , pp. 2818-2820
    • Ng, H.M.1    Moustakas, T.D.2    Chu, S.N.G.3
  • 6
    • 0001904229 scopus 로고    scopus 로고
    • The effect of H2 on morphology evolution during GaN metalorganic chemical vapor deposition
    • HAN, J., NG, T.-B., BIEFELD, R.M., CRAWFORD, M.H., and FOLLSTAEDT, D.M.: 'The effect of H2 on morphology evolution during GaN metalorganic chemical vapor deposition', Appl. Phys. Lett., 1997, 71, pp. 3114-3116
    • (1997) Appl. Phys. Lett. , vol.71 , pp. 3114-3116
    • Han, J.1    Ng, T.-B.2    Biefeld, R.M.3    Crawford, M.H.4    Follstaedt, D.M.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.