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Journal of the Electrochemical Society

Volumn 147, Issue 10, 2000, Pages 3935-3939

Effects of H2 and/or O2 plasma treatments on photoconductivity of freestanding polycrystalline diamond films

(8) Kim, S H a Han, I T b Kim, Y H c Kim, T G d Kang, S G e Lee, S H f Moon, S B f Kim, D G g

a Silla University (South Korea)

b Samsung Advanced Institute of Technology (SAIT) (South Korea)

c Korea University (South Korea)

d Miryang National University (South Korea)

e Hoseo University (South Korea)

f Pusan National University (South Korea)

g Daegu National University of Education (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIRECT CURRENT SPUTTERING SYSTEM; METAL ELECTRODE; MICROWAVE POWER;

FILM GROWTH; HYDROGEN; OXYGEN; PHOTOCONDUCTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SUBSTRATES; SURFACE TREATMENT;

DIAMOND FILMS;

EID: 0034296259 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1393999 Document Type: Article

Times cited : (3)

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