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EPJ Applied Physics

Volumn 12, Issue 1, 2000, Pages 55-60

Transmission electron microscopy of NdNiO3 thin films on silicon substrates

(6) Laffez, P a Retoux, R a Boullay, P b Zaghrioui, M a Lacorre, P a Van Tendeloo, G b

a UNIVERSITÉ DU MAINE (France)

b UNIVERSITY OF ANTWERP (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; GRAIN BOUNDARIES; HIGH RESOLUTION ELECTRON MICROSCOPY; NEODYMIUM COMPOUNDS; OXYGEN; PRESSURE EFFECTS; SILICON; SUBSTRATES; TEXTURES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; TRANSPORT PROPERTIES;

LOW-DIMENSIONAL STRUCTURES;

METALLIC FILMS;

EID: 0034294848 PISSN: 12860042 EISSN: None Source Type: Journal
DOI: 10.1051/epjap:2000171 Document Type: Article

Times cited : (18)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.