Electrochemical behaviour of alkaline copper complexes

Proceedings of the Indian Academy of Sciences: Chemical Sciences

Volumn 112, Issue 5, 2000, Pages 543-550

  Aravinda, C L ^a   Mayanna, S M ^a   Muralidharan, V S ^b  

^a Central College   (India)

^b CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COPPER PLATING; CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; ISOTHERMS; PLATINUM; REDUCTION;

ALKALINE COPPER COMPLEXES; LANGMUIR ISOTHERM; MONOVALENT; NONCYANIDE PLATING; TEMKIN ISOTHERM; TRIETHANOLAMINE; TRISODIUM CITRATE;

COPPER COMPOUNDS;

EID: 0034292716     PISSN: 02534134     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02709287     Document Type: Article

References (8)

1. Kolthoff M and Lingane J J 1952 Polarography (New York: Interscience)
2. Vonstackelberg M and Vonfreyhald H 1940 Z. Electrochem. 46 120
3. Khan S H and Khan A A 1969 J. Electroanal. Chem. 22 424
4. Furness W, Crawshaw P and Daview W C 1949 Analyst 74 629
5. Mayanna S M and Maruthi B N 1996 Metal Finishing 46 42
6. Bard A J 1976 Encyclopedia of electrochemistry of the elements (New York: Marcel)
7. Nicholson R S and Shain I 1964 Anal. Chem. 36 706
8. Macdonald D D 1977 Transient techniques in electrochemistry (New York: Plenum) p. 193