메뉴 건너뛰기




Volumn 132, Issue 2-3, 2000, Pages 111-116

Formation of titanium oxide films on titanium and Ti6A14V by O2-plasma immersion ion implantation

Author keywords

Oxygen ion implantation; Plasma immersion ion implantation; Ti6A14V; Titanium; Titanium oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFUSION IN SOLIDS; FILM GROWTH; ION IMPLANTATION; PHASE COMPOSITION; PLASMA APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE ROUGHNESS; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

EID: 0034292464     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00712-X     Document Type: Article
Times cited : (65)

References (17)
  • 12
    • 0006684852 scopus 로고    scopus 로고
    • KONZRBS, University of Augsburg, Germany
    • (1997)
    • Wenzel, A.1
  • 13
    • 0006686996 scopus 로고    scopus 로고
    • International Center for Diffraction Data, Park Lane; Powder Diffraction Files: 21-1276 (Rutile), 21-1272 (Anatase), 23-1078 (αTiO)
    • (1997)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.