-
3
-
-
85031536770
-
-
submitted
-
M. Hannemann, P. Hardt, D. Loffhagen, M. Schmidt, R. Winkler, Plasma Sources Sci. Technol., submitted.
-
Plasma Sources Sci. Technol.
-
-
Hannemann, M.1
Hardt, P.2
Loffhagen, D.3
Schmidt, M.4
Winkler, R.5
-
9
-
-
37049134377
-
-
Burroughs P., Evans S., Hamnett A., Orchard A.F., Richardson N.V. J. Chem. Soc. Faraday Trans. II. 70:1974;1895.
-
(1974)
J. Chem. Soc. Faraday Trans. II
, vol.70
, pp. 1895
-
-
Burroughs, P.1
Evans, S.2
Hamnett, A.3
Orchard, A.F.4
Richardson, N.V.5
-
10
-
-
0000990854
-
-
Green J.C., Green M.L.H., Joachim P.J., Orchard A.F., Turner D.W. Phil. Trans. R. Soc. (London). A268:1970;111.
-
(1970)
Phil. Trans. R. Soc. (London)
, vol.268
, pp. 111
-
-
Green, J.C.1
Green, M.L.H.2
Joachim, P.J.3
Orchard, A.F.4
Turner, D.W.5
-
13
-
-
0002434684
-
-
Deutsch H., Märk T.D., Tarnovsky V., Becker K., Cornelissen C., Cespiva L., Bonacic-Koutecky V. Int. J. Mass Spectrom. Ion Process. 137:1994;77.
-
(1994)
Int. J. Mass Spectrom. Ion Process.
, vol.137
, pp. 77
-
-
Deutsch, H.1
Märk, T.D.2
Tarnovsky, V.3
Becker, K.4
Cornelissen, C.5
Cespiva, L.6
Bonacic-Koutecky, V.7
-
14
-
-
0001751483
-
-
Kim Y.-K., Hwang W., Weinberger N.M., Ali M.A., Rudd M.E. J. Chem. Phys. 106:1997;1026.
-
(1997)
J. Chem. Phys.
, vol.106
, pp. 1026
-
-
Kim, Y.-K.1
Hwang, W.2
Weinberger, N.M.3
Ali, M.A.4
Rudd, M.E.5
-
16
-
-
0001162555
-
-
Tarnovsky V., Levin A., Becker K., Basner R., Schmidt M. Int. J. Mass Spectrom. Ion Process. 133:1994;175.
-
(1994)
Int. J. Mass Spectrom. Ion Process.
, vol.133
, pp. 175
-
-
Tarnovsky, V.1
Levin, A.2
Becker, K.3
Basner, R.4
Schmidt, M.5
-
17
-
-
0000525579
-
-
Basner R., Schmidt M., Deutsch H., Tarnovsky V., Levin A., Becker K. J. Chem. Phys. 103:1995;211.
-
(1995)
J. Chem. Phys.
, vol.103
, pp. 211
-
-
Basner, R.1
Schmidt, M.2
Deutsch, H.3
Tarnovsky, V.4
Levin, A.5
Becker, K.6
-
19
-
-
0038775820
-
-
Basner R., Foest R., Schmidt M., Sigeneger F., Kurunczi P., Becker K., Deutsch H. Int. J. Mass Spectrom. Ion Process. 153:1996;65.
-
(1996)
Int. J. Mass Spectrom. Ion Process.
, vol.153
, pp. 65
-
-
Basner, R.1
Foest, R.2
Schmidt, M.3
Sigeneger, F.4
Kurunczi, P.5
Becker, K.6
Deutsch, H.7
-
21
-
-
0001096840
-
-
Basner R., Foest R., Schmidt M., Becker K., Deutsch H. Int. J. Mass Spectrom. Ion Process. 176:1998;245.
-
(1998)
Int. J. Mass Spectrom. Ion Process.
, vol.176
, pp. 245
-
-
Basner, R.1
Foest, R.2
Schmidt, M.3
Becker, K.4
Deutsch, H.5
-
22
-
-
77956675863
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Electron impact ionization of organic silicon compounds
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M. Inokuti, Becker K. New York: Academic Press
-
Basner R., Schmidt M., Becker K., Deutsch H. Electron impact ionization of organic silicon compounds. Inokuti M., Becker K. Advances in Atomic, Molecular, and Optical Physics. 43:1999;147-185 Academic Press, New York.
-
(1999)
Advances in Atomic, Molecular, and Optical Physics
, vol.43
, pp. 147-185
-
-
Basner, R.1
Schmidt, M.2
Becker, K.3
Deutsch, H.4
-
25
-
-
0000668833
-
-
Deutsch H., Becker K., Basner R., Schmidt M., Märk T.D. J. Phys. Chem. 102:1998;8819.
-
(1998)
J. Phys. Chem.
, vol.102
, pp. 8819
-
-
Deutsch, H.1
Becker, K.2
Basner, R.3
Schmidt, M.4
Märk, T.D.5
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