Characterization of an imaging extreme-ultraviolet flat-field spectrometer and its application to extreme-ultraviolet emission profile measurement

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 10, 2000, Pages 6062-6066

  Kim, Jaehoon ^a   Kim, Dong Eon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COMPUTER SIMULATION; IMAGING SYSTEMS; LASER PRODUCED PLASMAS; LIGHT EMISSION; MIRRORS; PROFILOMETRY; RAY TRACING;

ABEL INVERSION; EXTREME ULTRAVIOLET EMISSION PROFILE MEASUREMENT; EXTREME ULTRAVIOLET FLAT FIELD SPECTROMETER; LASER PRODUCED CARBON PLASMA; OPTICAL AXIS; SPATIAL IMAGING;

ULTRAVIOLET SPECTROMETERS;

EID: 0034291532     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6062     Document Type: Article

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