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Volumn 465, Issue 1-2, 2000, Pages 177-185
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Role of hydrogen prepairing in the hydrogen desorption kinetics from Si(100)-2×1: Effects of hydrogenating-gas and thermal history
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
DIFFUSION IN SOLIDS;
HYDROGENATION;
MOLECULAR BEAM EPITAXY;
REACTION KINETICS;
SILANES;
TEMPERATURE PROGRAMMED DESORPTION;
THERMODYNAMICS;
SURFACE THERMODYNAMICS;
SEMICONDUCTING SILICON;
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EID: 0034291481
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(00)00710-X Document Type: Article |
Times cited : (14)
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References (23)
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