Porous amorphous fluoropolymer films with ultralow dielectric constant

Chinese Physics

Volumn 9, Issue 10, 2000, Pages 778-782

  Ding, Shi Jin ^a   Wang, Peng Fei ^a   Zhang, Wei ^a   Wang, Ji Tao ^a   Wei, William Lee ^b   Zhang, Ye Wen ^c   Xia, Zhong Fu ^c  

^a FUDAN UNIVERSITY   (China)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^c TONGJI UNIVERSITY   (China)

Author keywords

Low dielectric constant; Porous amorphous fluoropolymer film; Spin coating; X ray photoelectron spectroscopy

Indexed keywords

EID: 0034288971     PISSN: 10091963     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-1963/9/10/012     Document Type: Article

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