|
|
Volumn 39, Issue 9, 2000, Pages 3249-3254
|
|
Stabilization of alumina polishing slurries using phosphonate dispersants
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ABRASIVES;
ADSORPTION;
ALUMINA;
DISPERSIONS;
IONS;
POTASSIUM COMPOUNDS;
SLURRIES;
SURFACES;
CHEMICAL MECHANICAL POLISHING (CMP);
ELECTRIC DOUBLE LAYERS;
ELECTROSTATIC INTERACTIONS;
PHOSPHONATE DISPERSANTS;
CHEMICAL POLISHING;
ALUMINUM OXIDE;
CITRIC ACID;
PHOSPHONIC ACID DERIVATIVE;
PHTHALIC ACID;
POTASSIUM DERIVATIVE;
ALUMINUM OXIDE;
DISPERSANT;
POLISHING;
SLURRY;
ADSORPTION;
ARTICLE;
ELECTRICITY;
MOLECULAR INTERACTION;
SEMICONDUCTOR;
SURFACE PROPERTY;
|
|
EID: 0034282798
PISSN: 08885885
EISSN: None
Source Type: Journal
DOI: 10.1021/ie0000717 Document Type: Article |
|
Times cited : (13)
|
|
References (2)
|
